Deep-etched fused silica grating as a (de)multiplexer for DWDM application at the 1.55-µm wavelength

Yanyan Zhang; Changhe Zhou; Huayi Ru; Shunquan Wang

doi:10.1117/12.575200

7 February 2005 Deep-etched fused silica grating as a (de)multiplexer for DWDM application at the 1.55-μm wavelength

Yanyan Zhang, Changhe Zhou, Huayi Ru, Shunquan Wang

Proceedings Volume 5636, Holography, Diffractive Optics, and Applications II; (2005) https://doi.org/10.1117/12.575200
Event: Photonics Asia, 2004, Beijing, China

Abstract

We report on diffraction performances of deep-etched transmission gratings in fused silica at the wavelength of 1.55μm. Profile parameters of the depth and line density are optimized to achieve the first order Bragg transmitted efficiency of more than 98% theoretically under TE- or TM-polarized incident lights. Spectra performance of a 630 lines/mm grating with the depth of 3.0μm in the C+L bands is presented in which the diffraction efficiency of each spectrum can be above 90%. By holography and inductive coupled plasma (ICP) etching, we have made a fused silica grating with the period of 610lines/mm and the depth of 0.73μm, the first order Bragg diffraction efficiency of which can reach 17% at the wavelength of 1.31 µm and 10% at 1.55 μm. Our results provide an important guideline for transmission gratings in fused silica as (de)multiplexers for dense wavelength division multiplexing (DWDM) application.

Citation Download Citation

Yanyan Zhang, Changhe Zhou, Huayi Ru, and Shunquan Wang "Deep-etched fused silica grating as a (de)multiplexer for DWDM application at the 1.55-μm wavelength", Proc. SPIE 5636, Holography, Diffractive Optics, and Applications II, (7 February 2005); https://doi.org/10.1117/12.575200

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