Paper
27 January 2005 A new method to determine the energy range for the FOCAL technique
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Abstract
An effective and simple method to determine the energy range of FOCAL is described in this paper. Relationship between the chop line width and defocus is analyzed. Simulated curves of the chop line width versus defocus are obtained by PROLITH. By choosing the curves which satisfy certain conditions, the energy range of FOCAL is determined off line. Independent of the lithographic tool, the method is time-saving and effective. The influences of some process factors, e.g. resist thickness, PEB temperature, PEB time and development time, on the energy range of FOCAL are analyzed.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dongqing Zhang, Xiangzhao Wang, Weijie Shi, Fan Wang, Liping Guo, Jianming Hu, Mingying Ma, and Le He "A new method to determine the energy range for the FOCAL technique", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.573815
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Adaptive optics

Image quality

Semiconducting wafers

Optical alignment

Calibration

Line width roughness

Lithography

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