Minimal area of average height parameter for surface microtopography measurement

Fusheng Yu; Xiaoqin Shen; Changlin Leng

doi:10.1117/12.572850

27 January 2005 Minimal area of average height parameter for surface microtopography measurement

Fusheng Yu, Xiaoqin Shen, Changlin Leng

Proceedings Volume 5645, Advanced Microlithography Technologies; (2005) https://doi.org/10.1117/12.572850
Event: Photonics Asia, 2004, Beijing, China

Abstract

For describing the micro-topography of a measured surface reasonably, this paper puts forward a parameter named minimal area of average height of the surface micro-topography based on the least square method, which is different from the qualitative uniformity surface parameters such as correlation theory, power spectral analysis, profile matrix spectrum and surface matrix spectrum. That means to look for the minimal size square which could represent the average height value of the sample area. If the deviation between the mean height values in this area and in the sample area is ±5% which is ±2σ of Gaussian distribution, and at the same time the ratio between the minimal area and the sample area is less than 0.8, then the measurement data from the sample area is considered as the characteristic of the measured surface micro-topography. Some standard samples finished by lapping grinding, surface grinding, planning, and end milling and plain milling are measured by using phase-shift Michelson and micro-grating-projection method in this paper. The two measurement principles are given in this paper. The R_a value of the standard samples measured and the measurement results of the minimal area of average height are given. The results shown that the parameter of minimal area of average height exist good consistency with the parameter of Ra.

Citation Download Citation

Fusheng Yu, Xiaoqin Shen, and Changlin Leng "Minimal area of average height parameter for surface microtopography measurement", Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); https://doi.org/10.1117/12.572850

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KEYWORDS

Phase measurement

Phase shifts

CCD cameras

Data processing

Mirrors

Radium

Microscopes

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