Analysis of laser durability of CaF2 for optical lithography

Guenter Grabosch; Lutz Parthier; Ute Natura; Karin Poehl; Martin Letz; Christian Muehlig; Konrad Knapp

doi:10.1117/12.585247

21 February 2005 Analysis of laser durability of CaF₂ for optical lithography

Guenter Grabosch, Lutz Parthier, Ute Natura, Karin Poehl, Martin Letz, Christian Muehlig, Konrad Knapp

Proceedings Volume 5647, Laser-Induced Damage in Optical Materials: 2004; (2005) https://doi.org/10.1117/12.585247
Event: Boulder Damage Symposium XXXVI, 2004, Boulder, Colorado, United States

Abstract

Photolithography is a key technolgoy for the production of semiconductor devices. It supports the continuing trend towards higher integration density of microelectronic devices. The material used in the optics of lithography tools has to be of extremely high quality to ensure the high demand of the imaging. Due to its properties CaF2 is a material of choice for the application in lithography systems. Because of the compexity of the lithography tools single lenses or lens system modules cannot be replaced. Therefore the lens material has to last the full lifetime of the tool without major degradation. According to the roadmap for next generation of optical lithography tools, like immersion lithography, the requirements of CaF2 for radiation hardness are increasing considerably. We will present a detailed analysis of the key factors influencing the laser hardness covering the complete production chain. Some aspects of the evaluation methods for testing CaF2 laser durability will be presented.

Citation Download Citation

Guenter Grabosch, Lutz Parthier, Ute Natura, Karin Poehl, Martin Letz, Christian Muehlig, and Konrad Knapp "Analysis of laser durability of CaF₂ for optical lithography", Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); https://doi.org/10.1117/12.585247

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