Integrated facility of UV and IR laser process to enhance laser damage resistance of large scale 3w optics

Annelise During; Laurent Lamaignere; Philippe R. Bouchut; Herve Piombini

doi:10.1117/12.585001

21 February 2005 Integrated facility of UV and IR laser process to enhance laser damage resistance of large scale 3w optics

Annelise During, Laurent Lamaignere, Philippe R. Bouchut, Herve Piombini

Author Affiliations +

Proceedings Volume 5647, Laser-Induced Damage in Optical Materials: 2004; (2005) https://doi.org/10.1117/12.585001
Event: Boulder Damage Symposium XXXVI, 2004, Boulder, Colorado, United States

Abstract

A new facility has been designed to enhance laser damage resistance at 351 nm of large scale 3w KDP and silica optics by laser treatment. This facility is a prototype, and the process will be industrialized as a means of fabrication of the LMJ optics. The first step of the process is a conditioning/initiation step, which consists of a UV laser raster scan of the whole optics; the second step is a step of detection and analysis of damage possibly initiated during the previous step; the third step is a mitigation step, which consists of a local melting of the detected damage on silica surface, in order to stop their growth. The facility is equipped with a 3w Nd:YAG laser allowing the process of both KDP and silica. A CO₂ laser is used for damage mitigation. Both the lifetime increase and the reduction of the process duration of large scale optics have been taken into account with a view to industrialize the process.

Citation Download Citation

Annelise During, Laurent Lamaignere, Philippe R. Bouchut, and Herve Piombini "Integrated facility of UV and IR laser process to enhance laser damage resistance of large scale 3w optics", Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); https://doi.org/10.1117/12.585001

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