You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
23 February 2005Frequency dependency of the characteristics in spiral-type thin film inductors
In this study, spiral inductors on the SiO2/Si(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of 0.7~2.0 μm was deposited on the substrate. Square inductors were fabricated through the wet chemical etching technique. The inductors are completely specified by the number of turns, coil width and the coil spacing. Both the width and spacing were varied from 10 to 50 μm and from 20 to 70 μm, respectively. The Frequency dependency of inductance and Q factor were investigated to analyze the performance of spiral inductors.
Bok-Ki Min,In-Sung Kim, andJae-Sung Song
"Frequency dependency of the characteristics in spiral-type thin film inductors", Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); https://doi.org/10.1117/12.582204
The alert did not successfully save. Please try again later.
Bok-Ki Min, In-Sung Kim, Jae-Sung Song, "Frequency dependency of the characteristics in spiral-type thin film inductors," Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); https://doi.org/10.1117/12.582204