Nanoimprint lithography: full wafer replication of nanometer features

Rainer Pelzer; Cecile Gourgon; Stefan Landis; Paul Kettner

doi:10.1117/12.582435

23 February 2005 Nanoimprint lithography: full wafer replication of nanometer features

Rainer Pelzer, Cecile Gourgon, Stefan Landis, Paul Kettner

Proceedings Volume 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II; (2005) https://doi.org/10.1117/12.582435
Event: Smart Materials, Nano-, and Micro-Smart Systems, 2004, Sydney, Australia

Abstract

Nanoimprint Lithography (NIL) is a fast, high resolution replication technology for micromechanics, microbiology and even for microelectronic applications in the sub-100nm range. The technique has been demonstrated to be a very promising next generation technique for large-area structure replication up to wafer-level in the micrometer and nanometer scale. For producing nanometer structures the capital investments required are much lower compared to other next generation methods (e-beam writing, x-ray lithography, EUV lithography, ...). Nanoimprint Lithography is based on two different techniques: Hot Embossing (HE) and UV-Nanoimprint Lithography (UV-NIL). Both methods can be used for replicating dense and isolated features in the range of 70nm to 100μm simultaneously on up to 200mm wafers.

Citation Download Citation

Rainer Pelzer, Cecile Gourgon, Stefan Landis, and Paul Kettner "Nanoimprint lithography: full wafer replication of nanometer features", Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); https://doi.org/10.1117/12.582435

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