Nanoimprint lithography: full wafer replication of nanometer features

Rainer Pelzer; Cecile Gourgon; Stefan Landis; Paul Kettner

doi:10.1117/12.582435

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23 February 2005 Nanoimprint lithography: full wafer replication of nanometer features

Rainer Pelzer, Cecile Gourgon, Stefan Landis, Paul Kettner

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Proceedings Volume 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II; (2005) https://doi.org/10.1117/12.582435
Event: Smart Materials, Nano-, and Micro-Smart Systems, 2004, Sydney, Australia

Abstract

Nanoimprint Lithography (NIL) is a fast, high resolution replication technology for micromechanics, microbiology and even for microelectronic applications in the sub-100nm range. The technique has been demonstrated to be a very promising next generation technique for large-area structure replication up to wafer-level in the micrometer and nanometer scale. For producing nanometer structures the capital investments required are much lower compared to other next generation methods (e-beam writing, x-ray lithography, EUV lithography, ...). Nanoimprint Lithography is based on two different techniques: Hot Embossing (HE) and UV-Nanoimprint Lithography (UV-NIL). Both methods can be used for replicating dense and isolated features in the range of 70nm to 100μm simultaneously on up to 200mm wafers.

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Rainer Pelzer, Cecile Gourgon, Stefan Landis, and Paul Kettner "Nanoimprint lithography: full wafer replication of nanometer features", Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); https://doi.org/10.1117/12.582435

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