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8 October 2004 Nanomachining of inorganic transparent materials using an x-ray exciton method
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Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.596284
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan
Abstract
We have investigated microfabrication of inorganic transparent materials using laser plasma soft X-rays with the diffraction limit of 10 nm. As a soft X-ray source, we used Ta laser plasma soft X-rays, whch has a light emission band at around 10 nm. A SiO2 film was confirmed to have absorption band in the soft X-ray region. Micromachining a quartz plate was demonstrated by irradiation with focused soft X-rays and pulsed 266 nm Nd:YAG laser light. The quartz plates are ablated smoothly at 85 nm/shots. It is found that more than 40% of 266 nm laser light is absorbed by the quartz plates just after soft X-ray irradiation at room temperature. Thus, it is shown that a transient state such as an X-ray generated exciton (X-ray exciton), which have absorption band in UV region, are generated by soft X-ray irradiation. The micromachining technique (X-ray exciton method) can utilize the high space resolution of soft X-ray and the high energy density of conventional UV/visible laser light. Further, we found that a variety of materials such as SiO2, LiNO3, Si, CaF2, LiF and Al2O3 are ablated smoothly by irradiation of the focused laser plasma soft X-rays without 266 nm laser light.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tetsuya Makimura, Yoichi Kenmotsu, Hisao Miyamoto, Michiaki Mori, Kiminori Kondo, and Kouichi Murakami "Nanomachining of inorganic transparent materials using an x-ray exciton method", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); https://doi.org/10.1117/12.596284
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