Thermo-correction of quasi-static optical distortions for EUV lithography

Sergei Alexandrovich Dimakov; Boris Vladimirovich Kislitsyn; Sergei Ivanovich Klimentiev; Alexander P. Zhevlakov; Dmitrii Ivanovich Zhuk

doi:10.1117/12.610993

12 April 2005 Thermo-correction of quasi-static optical distortions for EUV lithography

Sergei Alexandrovich Dimakov, Boris Vladimirovich Kislitsyn, Sergei Ivanovich Klimentiev, Alexander P. Zhevlakov, Dmitrii Ivanovich Zhuk

Author Affiliations +

Proceedings Volume 5708, Laser Resonators and Beam Control VIII; (2005) https://doi.org/10.1117/12.610993
Event: Lasers and Applications in Science and Engineering, 2005, San Jose, California, United States

Abstract

Now optical reducing systems for extreme ultraviolet projection lithography are being actively developed. Optical elements of these systems are required to be of super-high optical quality. For systems operating in the 13-nm wavelength range, their optical distortions should not exceed 1 nm in magnitude. Manufacturing of such elements with super-high optical quality requires large financial injections. In this report, we consider how to use thermal deformation of an optical element exposed to light for improvement of optical quality of the element. It is shown, in particular, that residual quasi-static large-scale (20% of diameter of the element) optical distortions, about 15 nm in magnitude, can be compensated with the proposed technique down to 0.5 nm (i.e. ≈ λ₀/20 - λ₀/30 for EUV).

Citation Download Citation

Sergei Alexandrovich Dimakov, Boris Vladimirovich Kislitsyn, Sergei Ivanovich Klimentiev, Alexander P. Zhevlakov, and Dmitrii Ivanovich Zhuk "Thermo-correction of quasi-static optical distortions for EUV lithography", Proc. SPIE 5708, Laser Resonators and Beam Control VIII, (12 April 2005); https://doi.org/10.1117/12.610993

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