You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
22 January 2005Large silicon micromirror modeling and fabrication
Electrostatic micromirrors are yet a well-known topic in the world of MOEMS. But in some specific cases, the mirror dimensions should have to be extended in order to be able to switch beams of a larger diameter. In other words, the convergence in dimensions between electronic technologies and classical machining in the range of hundreds microns to millimetre was not yet explored. This is the context of our study, whose goal is to make digital switching devices with a size of some millimetres and a large, pre-fixed deflection angle of ten degrees.
The alert did not successfully save. Please try again later.
Alexandre Marchese, Henri Camon, Christian Ganibal, "Large silicon micromirror modeling and fabrication," Proc. SPIE 5717, MEMS/MOEMS Components and Their Applications II, (22 January 2005); https://doi.org/10.1117/12.590270