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22 January 2005 A high-end mask writer using a spatial light modulator
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Abstract
This paper presents the properties of the Sigma7300 which is a commercial DUV laser pattern generator based on spatial light modulator (SLM) technology designed to meet the requirements of the 65-nm technology node and below. The introduction of spatial light modulators provides a possibility for optical mask writers to combine high resolution and accuracy with short write time making it possible to write most of the high end mask layers in a cost effective way. The Sigma7300 mask writer is developed by Micronic Laser Systems whereas the SLM, which is a combined MEMS and CMOS component with individually controllable movable micromirrors, is developed by the Fraunhofer-IPMS institute in Dresden. The SLM allows parallel writing of one million pixels with a frame rate of up to 2 kHz. The technology offers resolution enhancement advantages from stepper technology not available in other mask patterning tools.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ulric B. Ljungblad, Per Askebjer, Tord Karlin, Tor Sandstrom, and Henrik Sjoeberg "A high-end mask writer using a spatial light modulator", Proc. SPIE 5721, MOEMS Display and Imaging Systems III, (22 January 2005); https://doi.org/10.1117/12.590934
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