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25 March 2005 Fabrication of vertically coupled silicon nanophotonic circuits via SIMOX 3D sculpting
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Abstract
A new process has been developed to create vertically-integrated photonic and optoelectronic circuits in silicon. The approach is the 3-D extension of the SIMOX process where buried SiO2 sections can be selectively created by using oxygen implantation, through a mask, followed by annealing. By controlling the implant energy, dose, mask area and thickness, arbitrary 3-D arrangements of Silicon/SiO2 can be created. The process has been used to create vertically coupled microdisk resonators and add-drop wavelength multiplexers on a silicon wafer.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bahram Jalali, Prakash Koonath, and Tejaswi Indukuri "Fabrication of vertically coupled silicon nanophotonic circuits via SIMOX 3D sculpting", Proc. SPIE 5729, Optoelectronic Integrated Circuits VII, (25 March 2005); https://doi.org/10.1117/12.590863
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