High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma

Yusuke Teramoto; Hiroto Sato; Kazunori Bessho; Gohta Niimi; Takahiro Shirai; Daiki Yamatani; Tetsu Takemura; Toshio Yokota; Khokan C. Paul; Kiyoyuki Kabuki; Koji Miyauchi; Mitsuru Ikeuchi; Kazuaki Hotta; Masaki Yoshioka; Koichi Toyoda

doi:10.1117/12.602021

6 May 2005 High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma

Yusuke Teramoto, Hiroto Sato, Kazunori Bessho, Gohta Niimi, Takahiro Shirai, Daiki Yamatani, Tetsu Takemura, Toshio Yokota, Khokan C. Paul, Kiyoyuki Kabuki, Koji Miyauchi, Mitsuru Ikeuchi, Kazuaki Hotta, Masaki Yoshioka, Koichi Toyoda

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.602021
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Discharge-produced plasma (DPP) based EUV source have been studied and developed at EUVA/Gotenba Branch. Among the several kinds of discharge scheme, a capillary Z-pinch has been employed in our source. An all-solid-state magnetic pulse compression (MPC) generator was used to create a Z-pinch plasma. Low inductance MPC generator provides a pulsed current with about 52 kA of peak amplitude and 120 ns of pulse duration, and allows 7-kHz operation. A water-cooled discharge head was coupled with the MPC generator. In order to evaluate the source performance, electrical energy input to the discharge, EUV radiation power, radiation spatial profile, plasma image and spectra were observed. In-band EUV power into usable solid angle obtained at 7 kHz was 93 W/2%BW. By using nested grazing-incidence collector, EUV power at intermediate focus obtained was 19 W/2%BW.

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Yusuke Teramoto, Hiroto Sato, Kazunori Bessho, Gohta Niimi, Takahiro Shirai, Daiki Yamatani, Tetsu Takemura, Toshio Yokota, Khokan C. Paul, Kiyoyuki Kabuki, Koji Miyauchi, Mitsuru Ikeuchi, Kazuaki Hotta, Masaki Yoshioka, and Koichi Toyoda "High-power and high-repetition-rate EUV source based on Xe discharge-produced plasma", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.602021

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