Translator Disclaimer
Paper
6 May 2005 Protection of collector optics in an LPP based EUV source
Author Affiliations +
Abstract
In a laser produced plasma (LPP) EUV source the multilayer mirror (MLM) collector optic will be exposed to a flux of energetic ions and neutral atoms ejected from the plasma as well as condensable vapor from excess target material. We are investigating various techniques for reducing the contamination flux and for in-situ removal of the contamination. The protection strategies under investigation must be compatible with gaseous and condensable target materials such as Xe, Sn, In, Li, and other elements. The goal is to develop MLM structures that can withstand elevated temperatures and develop protective barrier coatings that reduce erosion of the mirror surface. Results of MLM exposure to energetic ion beams and thermal atomic sources are presented. Changes in EUV reflectivity of MLM structures after exposure to ions and deposition of target material have been performed on samples cleaned by these developmental processes. In this paper, we will summarize our initial results in these areas and present techniques for mitigation of MLM damage from the source.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. L. Rettig, O. V. Khodykin, J. R. Hoffman, W. F. Marx, N. R. Bowering, E. Vargas, A. I. Ershov, I. V. Fomenkov, and W. N. Partlo "Protection of collector optics in an LPP based EUV source", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.601517
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Study of Sn removal by surface wave plasma for source...
Proceedings of SPIE (March 24 2017)
High power LPP EUV source system development status
Proceedings of SPIE (December 10 2009)
LPP EUV source development for HVM
Proceedings of SPIE (March 23 2006)
High repetition rate LPP source facility for EUVL
Proceedings of SPIE (March 22 2007)
Light sources for EUV lithography at the 22 nm node...
Proceedings of SPIE (March 23 2012)

Back to Top