CD reference features with sub-five nanometer uncertainty

M. W. Cresswell; R. G. Dixson; W. F. Guthrie; R. A. Allen; C. E. Murabito; B. Park; J. V. Martinez de Pinillos; A. Hunt

doi:10.1117/12.606807

10 May 2005 CD reference features with sub-five nanometer uncertainty

M. W. Cresswell, R. G. Dixson, W. F. Guthrie, R. A. Allen, C. E. Murabito, B. Park, J. V. Martinez de Pinillos, A. Hunt

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.606807
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The implementation of a new test structure for HRTEM (High-Resolution Transmission Electron Microscopy) imaging, and the use of CD AFM (CD Atomic Force Microscopy) to serve as the transfer metrology, have resulted in reductions in the uncertainties attributed to critical dimension (CD) reference-material features, having calibrated CDs less than 100 nm. The previous generation of reference materials, which was field-tested in 2001, used electrical CD as the transfer metrology. Calibrated CD values were in the range 80 nm to 150 nm and expanded uncertainties were approximately ± 14 nm. The second-generation units, which have now been distributed to selected industry users for evaluation, have uncertainties as low as ±1.5 nm and calibrated CDs as low as 43 nm.

Citation Download Citation

M. W. Cresswell, R. G. Dixson, W. F. Guthrie, R. A. Allen, C. E. Murabito, B. Park, J. V. Martinez de Pinillos, and A. Hunt "CD reference features with sub-five nanometer uncertainty", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.606807

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