Etching error analysis of dot grating array in microlithography fabrication

N. K. Bao; Z. Y. Chen

doi:10.1117/12.598161

10 May 2005 Etching error analysis of dot grating array in microlithography fabrication

N. K. Bao, Z. Y. Chen

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.598161
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

This paper described the error effect in fabricating process of dot grating array using the Electro-Beam Lithography (EBL). These errors show the change in the width and depth of each pixel of binary optical element (BOE). It will directly induce the errors of the position and phase of transmission beam. The experimental simulating results are compared with that of the theoretical ones.

Citation Download Citation

N. K. Bao and Z. Y. Chen "Etching error analysis of dot grating array in microlithography fabrication", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.598161

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