You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
4 May 2005ARC and gap fill material with high etch rate for advanced dual damascene process
In the case of LSI pattern rules with linewidth of 0.1μm or less, the conventional LSI process is no longer adequate and new process and materials are needed to further enhance the performance of LSI. The materials used to reduce delay include a wiring material, Cu, and a low-k film for interlayer insulation. The technology specially developed for using Cu instead of Al as a wiring material is Dual Damascene process (DD process). In DD process, bottom anti-reflective coating (BARC) and gap fill materials are applied on a substrate of huge topography. Therefore, the gap fill material has to provide a coating of reduced thickness bias between the areas of isolated-via and dense-via, have a higher etch rate than ArF resists, be void free, and have no intermixing with resists and BARC.
In order to achieve lower dielectric constant, porous low-k materials will be used at BEOL for the next generation. Etch rates of porous low-k materials are higher than that of conventional low-k materials, which in turn requires a gap fill material of even higher etch rate. This paper describes the new BARC and gap fill material with high etch rate for 45 - 65 node DD processes. The polymer of new materials applies high oxygen content for high etch rate. The performance and via-filling properties in BARC (NCA4401C) and gap fill material (NCA2131) are discussed.
The alert did not successfully save. Please try again later.
Tetsuya Shinjo, Satoshi Takei, Yasushi Sakaida, Anwei Qin, Yasuyuki Nakajima, "ARC and gap fill material with high etch rate for advanced dual damascene process," Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); https://doi.org/10.1117/12.599249