Characterization, modeling, and impact of scattered light in low-k1 lithography

Bruno La Fontaine; Yunfei Deng; Mircea Dusa; Alden Acheta; Anita Fumar-Pici; Harish Bolla; Beverly Cheung; Bhanwar Singh; Harry J. Levinson

doi:10.1117/12.601188

12 May 2005 Characterization, modeling, and impact of scattered light in low-k₁ lithography

Bruno La Fontaine, Yunfei Deng, Mircea Dusa, Alden Acheta, Anita Fumar-Pici, Harish Bolla, Beverly Cheung, Bhanwar Singh, Harry J. Levinson

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601188
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

In this paper we present a method to characterize scattered light in lithography scanners based on the measurement of the modulation transfer function (MTF) of the lens. This method provides a description of scattered light at all length scales, or spatial frequencies, relevant to lithographic printing. We also introduce a new automated technique based on scatterometry that improves the precision and repeatability of the MTF measurement. Modeling of flare is important to quantify the impact of scattered light on the critical dimension of the features printed on chips. We have developed simulation methods based on actual data from our lithography scanners. Our model uses the MTF of the lens and the Fourier transform of the chip density map to calculate the flare distribution across the chips. We show that this approach is useful to understand how the characteristics of different scanners in our fabrication facilities might affect the critical dimension (CD) uniformity across our product chips.

Citation Download Citation

Bruno La Fontaine, Yunfei Deng, Mircea Dusa, Alden Acheta, Anita Fumar-Pici, Harish Bolla, Beverly Cheung, Bhanwar Singh, and Harry J. Levinson "Characterization, modeling, and impact of scattered light in low-k₁ lithography", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601188

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