Author Affiliations +
J. Heumann,1 J. Schramm,1 A. Birnstein,1 K. T. Park,2 T. Witte,1 N. Morgana,3 M. Hennig,3 R. Pforr,3 J. Thiele,3 N. Schmidt,4 C. Aquino4
1Advanced Mask Technology Ctr. (Germany)
2DPI/Advanced Mask Technology Ctr. (Germany)
3Infineon Technologies AG (Germany)
4KLA-Tencor Corp. (United States)