Long-term Zernike lens aberration measurement

Patrick Lomtscher; Gerhard Kunkel; Bill Roberts

doi:10.1117/12.598738

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12 May 2005 Long-term Zernike lens aberration measurement

Patrick Lomtscher, Gerhard Kunkel, Bill Roberts

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Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.598738
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Monitoring long-term performance of projection optics in lithographic exposure systems will become more and more important, especially for 193nm wavelength. Various effects influence the quality and long-term stability of a lens projection system. Using the well known and established blazed phasegrating method, it is possible to identify lens degradation before it becomes a significant detractor in a manufacturing process. A two beam interferometer formed by a blazed grating reticle is used to measure the aberration values. This works for all DUV tools, and therefore it allows a comparison of tools from different suppliers. The test can be run after regular preventive maintenance or as daily monitor checks, in order to evaluate lens aberration over time. By storing the results, it is easy to generate a tool individual database. With this paper, we will show aberration data over time and the possibility to increase tool performance and stability.

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Patrick Lomtscher, Gerhard Kunkel, and Bill Roberts "Long-term Zernike lens aberration measurement", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.598738

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