Mask enhancer technology for 45-nm node contact hole fabrication

Takashi Yuito; Vincent Wiaux; Lieve Van Look; Geert Vandenberghe; Shigeo Irie; Takahiro Matsuo; Akio Misaka; Hisashi Watanabe; Masaru Sasago

doi:10.1117/12.598977

12 May 2005 Mask enhancer technology for 45-nm node contact hole fabrication

Takashi Yuito, Vincent Wiaux, Lieve Van Look, Geert Vandenberghe, Shigeo Irie, Takahiro Matsuo, Akio Misaka, Hisashi Watanabe, Masaru Sasago

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.598977
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We have proposed a new resolution enhancement technology using attenuated mask with phase shifting aperture, named "Mask Enhancer", for random-logic contact hole pattern printing. In this study, we apply a new mask blank on Mask Enhancer in order to prevent the light intensity loss caused by the mask topography effect. We also perform to expose the new Mask Enhancer on the first ArF immersion scanner, ASML AT1150i. We demonstrate that the new Mask Enhancer can achieve 45nm-node contact hole printing with sufficient lithographic performance with combination of immersion lithography.

Citation Download Citation

Takashi Yuito, Vincent Wiaux, Lieve Van Look, Geert Vandenberghe, Shigeo Irie, Takahiro Matsuo, Akio Misaka, Hisashi Watanabe, and Masaru Sasago "Mask enhancer technology for 45-nm node contact hole fabrication", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.598977

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