The fabrication process and characteristics of light loss free zero-space microlenses for CMOS image sensor

Sang Uk Lee; Jeong Lyeol Park; Jae Sung Choi; Jeong Gun Lee

doi:10.1117/12.600383

12 May 2005 The fabrication process and characteristics of light loss free zero-space microlenses for CMOS image sensor

Sang Uk Lee, Jeong Lyeol Park, Jae Sung Choi, Jeong Gun Lee

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.600383
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We report a novel method to fabricate zero-space microlenses without light loss for CMOS image sensor. Classical microlenses for CMOS image sensor, adopted for achieving high quality images by providing appropriate propagation and collection of light onto photo diode, are typically formed by patterning and thermal flowing process of square type photo resist array sequentially. In that process, sufficient spaces between microlenses must be maintained to avoid merging by keeping an isolated microlens for in arrayed lenses during thermal flowing process. In order to remove the spaces between microlenses, we have developed a dual step patterning process in conjunction with optimal thermal flowing process developed for obtaining optimum microlens shape. The characteristics of zero-space microlenses without light loss were also demonstrated comparing with classical microlenses.

Citation Download Citation

Sang Uk Lee, Jeong Lyeol Park, Jae Sung Choi, and Jeong Gun Lee "The fabrication process and characteristics of light loss free zero-space microlenses for CMOS image sensor", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600383

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