Paper
12 May 2005 The problem of optimal placement of sub-resolution assist features (SRAF)
Maharaj Mukherjee, Scott Mansfield, Lars Liebmann, Alexey Lvov, Evanthia Papadapoulou, Mark Lavin, Zengqin Zhao
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Abstract
In this paper, we present a formulation of the Sub-Resolution Assist Feature (SRAF) placement problem as a geometric optimization problem. We present three independent geometric methodologies that use the above formulation to optimize SRAF placements under mask and lithographic process constraints. Traditional rules-based methodology, are mainly one dimensional in nature. These methods, though apparently very simple, has proven to be inadequate for complex two-dimensional layouts. The methodologies presented in this paper, on the other hand, are inherently two-dimensional and attempt to maximize SRAF coverage on real and complex designs, and minimizes mask rule and lithographic violations.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Maharaj Mukherjee, Scott Mansfield, Lars Liebmann, Alexey Lvov, Evanthia Papadapoulou, Mark Lavin, and Zengqin Zhao "The problem of optimal placement of sub-resolution assist features (SRAF)", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.599884
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CITATIONS
Cited by 8 scholarly publications and 2 patents.
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KEYWORDS
SRAF

Photomasks

Manufacturing

Lithography

Resolution enhancement technologies

Spatial frequencies

Algorithms

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