Integrated circuit DFM framework for deep sub-wavelength processes

J. A. Torres; C. N. Berglund

doi:10.1117/12.599044

5 May 2005 Integrated circuit DFM framework for deep sub-wavelength processes

J. A. Torres, C. N. Berglund

Proceedings Volume 5756, Design and Process Integration for Microelectronic Manufacturing III; (2005) https://doi.org/10.1117/12.599044
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Until recently little has been done to formalize the concept of design for manufacturability (DFM) for integrated circuits. This is a complex problem that has been addressed from multiple angles with different degrees of success . While there can be certain operations which improve one manufacturability component, they can also adversely affect another. For this reason a framework that systematically addresses multiple manufacturability tradeoffs is required. This work proposes a pattern-centric DFM framework which emphasizes pattern robustness and introduces the concept of process variability bands (pv-Bands) to create a ranking system to measure the manufacturability of any design. The ranking system is composed of manufacturability indices, and their behavior is presented for different process nodes as well as across multiple processing layers (i.e. metal1, active, poly, etc). As an example of the necessity of such a framework, lithography-compliant rules are defined to suggest how other manufacturing processing steps need to be characterized in order to be successfully integrated in the framework. Examples of pinching (necking), bridging and CD control rules based on a pv-Band description are also discussed. In addition this work includes a description on how the process models derived from this study can be used to improve electrical analysis via a more accurate device description. As an example, timing-process-windows are defined as the link between design requirements and pattern manufacturability, and indicate why electrical models need to explicitly account for pattern induced effects at conditions other than nominal.

Citation Download Citation

J. A. Torres and C. N. Berglund "Integrated circuit DFM framework for deep sub-wavelength processes", Proc. SPIE 5756, Design and Process Integration for Microelectronic Manufacturing III, (5 May 2005); https://doi.org/10.1117/12.599044

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available