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16 May 2005 A novel approach to fabricate metallic nano-cantilevers
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Abstract
A novel approach is proposed in this work to fabricate metallic nano-cantilevers using a one-mask process and deep reactive ion etch (DRIE) technique. Proof-of-concept experiments were conducted, and 40-nm-thick Al and 70-nm-thick Au cantilevers of lengths from 5μm and widths in the range of 200-300nm were fabricated on a silicon substrate. It is found that the silicon underneath the suspended beams had been completely etched. The fabricated metallic nanocantilevers have potential applications in detecting molecules with high sensitivity. Initial stress induced deflection studies have shown these metallic nanocantilevers to be very sensitive to surface modifications.
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Cheng Luo and Anirban Chakraborty "A novel approach to fabricate metallic nano-cantilevers", Proc. SPIE 5763, Smart Structures and Materials 2005: Smart Electronics, MEMS, BioMEMS, and Nanotechnology, (16 May 2005); https://doi.org/10.1117/12.600305
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