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9 May 2005 X-ray microscopy for NDE of micro- and nano-structrues (Invited Paper)
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Abstract
X-ray imaging offers a number of unique properties that are favorable for NDE applications, including large penetration depth, elemental specificity, and relatively low radiation damage. While direct-projection type x-ray systems with a few um resolution have been widely deployed, recent advances in x-ray optics and imaging methodology have lead to lens-based x-ray microscopes with better than 60-nm resolution, and with integrated 3D imaging and material analysis capabilities. Used independently or in combination with established techniques based on visible light and electron microscopy, these new high-resolution x-ray systems introduces many attractive new capabilities for studying structures at micrometer to tens-of-nm scale.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Steve Wang, Frederick Duewer, Michael Feser, David Scott, and Wenbing Yun "X-ray microscopy for NDE of micro- and nano-structrues (Invited Paper)", Proc. SPIE 5766, Testing, Reliability, and Application of Micro- and Nano-Material Systems III, (9 May 2005); https://doi.org/10.1117/12.601370
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