Characterization of ZnO films grown on different substrates by L-MBE method

Xiaodong Yang; Jingwen Zhang; Qing'an Xu; Yongning He; Hongbo Wang; Weifeng Zhang; Xun Hou

doi:10.1117/12.608013

8 December 2004 Characterization of ZnO films grown on different substrates by L-MBE method

Xiaodong Yang, Jingwen Zhang, Qing'an Xu, Yongning He, Hongbo Wang, Weifeng Zhang, Xun Hou

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.608013
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

ZnO films were fabricated using Laser molecular beam epitaxy method on different substrates including Si(001), C-plane and R-plane Al₂O₃. The crystallinity and orientation of the films, as well as the epitaxial relationship between ZnO films and the substrate were studied using X-ray diffraction (XRD) technique. For the films grown on C-plane Al₂O₃ and Si(001) substrates, Highly c-axis oriented ZnO films were obtained. The surface morphology and roughness of ZnO films were determined by atomic force microscopy (AFM) and Reflection High Energy Electron diffraction (RHEED).

Citation Download Citation

Xiaodong Yang, Jingwen Zhang, Qing'an Xu, Yongning He, Hongbo Wang, Weifeng Zhang, and Xun Hou "Characterization of ZnO films grown on different substrates by L-MBE method", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.608013

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