Research for polyimide as a sacrificial layer in MEMS device

Meili Hu; Jinjin Chen; Zhongshen Lai; Huibing Mao; Dexin Sheng

doi:10.1117/12.608035

8 December 2004 Research for polyimide as a sacrificial layer in MEMS device

Meili Hu, Jinjin Chen, Zhongshen Lai, Huibing Mao, Dexin Sheng

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.608035
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

Polyimide has been an important sacrificial layer material in the MEMS switch. Polyimide can be spun and photographied on silicon substrate. NaOH liquid can etch and develop polyimide. Then it needs to cure. After MEMS switch are manufactured, polyimide must be removed. The different cure temperature and time impacts the character of polyimide. The experiment result shows that it is easy to remove and can be lithographed. So it is suitable for microwave device. In this paper, refers that polyimide can be etched by NaOH, O₂ and CF₄.

Citation Download Citation

Meili Hu, Jinjin Chen, Zhongshen Lai, Huibing Mao, and Dexin Sheng "Research for polyimide as a sacrificial layer in MEMS device", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.608035

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