Improvement of a silicon-based non-silicon torsion micro-mirror for optical switch

Yuan Luo; Yi Zhang

doi:10.1117/12.603190

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3 June 2005 Improvement of a silicon-based non-silicon torsion micro-mirror for optical switch

Yuan Luo, Yi Zhang

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Proceedings Volume 5825, Opto-Ireland 2005: Optoelectronics, Photonic Devices, and Optical Networks; (2005) https://doi.org/10.1117/12.603190
Event: OPTO-Ireland, 2005, Dublin, Ireland

Abstract

Torsion micro-mirror is the key structure of MEMS optical devices such as MEMS optical switches, MEMS variable optical attenuator, MEMS scanning micro-mirror array and so on. In this paper, after testing a silicon-based non-silicon micro-mirror fabricated by bulk micromachining, some important measurement data has been achieved. It is clear that this silicon-based non-silicon micro-mirror scheme can has just less than 15 degree rotation at 20V driving voltage while the beam thickness is just 0.5 m m . In order to improving the stability, reliability and optical properties of the micro-mirror, a new scheme has been put forward and the fabricating process using surface-micromachining has been simulated. It is shown that the new scheme will improve the characteristics of the micro-mirror effectively.

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Yuan Luo and Yi Zhang "Improvement of a silicon-based non-silicon torsion micro-mirror for optical switch", Proc. SPIE 5825, Opto-Ireland 2005: Optoelectronics, Photonic Devices, and Optical Networks, (3 June 2005); https://doi.org/10.1117/12.603190

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