Paper
16 June 2005 Flare metrology used for PSD reconstruction
Michael Arnz
Author Affiliations +
Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637297
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany
Abstract
During the last years due to low-k1 imaging , mid- and longrange flare as well as the necessity to quantify it , became more and more important for lithography optical systems. The so-called power spectral density (PSD) was proven to be an adequate means for describing rangedependent flare. At Carl Zeiss SMT AG a PSD metrology was concepted and sucessfully tested as one method for newest generation systems. We will give an outline into this aerial image based metrology and especially pay attention onto: 1. signal calibration as well as accurate focussing and lateral positioning 2. vignetting-free detection in face of large numerical apertures (near 1) 3. correlation with alternative flare metrics used in our house Both the necessity and the potential for extending the technique towards 193 nm immersion lithographic systems will be basically shown , too. The application of well-known models like the ABC and (as special case) the fractal PSD-model will be discussed for typical measurements. Limit cases and their physical meaning will be deduced for the fractal model.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Arnz "Flare metrology used for PSD reconstruction", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637297
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Cited by 2 scholarly publications.
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KEYWORDS
Fractal analysis

Point spread functions

Metrology

Reticles

Charge-coupled devices

Lithography

CCD image sensors

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