Negative refraction based on the superprism effect in a micromachined flexible photonic crystal

M. Tinker; J. B. Lee; E. Schonbrun; W. Park

doi:10.1117/12.608736

7 July 2005 Negative refraction based on the superprism effect in a micromachined flexible photonic crystal

M. Tinker, J. B. Lee, E. Schonbrun, W. Park

Proceedings Volume 5840, Photonic Materials, Devices, and Applications; (2005) https://doi.org/10.1117/12.608736
Event: Microtechnologies for the New Millennium 2005, 2005, Sevilla, Spain

Abstract

We report data on a new nanophotonic device based on a 2-D slab silicon photonic crystal (PC) matrix composed of a periodic array of high index silicon pillars embedded within a flexible low index polyimide matrix. To our knowledge, for the first time, negative refraction based on the superprism effect is reported in a 2-D silicon-based photonic crystal device. This work has a huge potential in various applications employed within silicon-based photonic crystal systems such as super-lenses, tunable filters, and optical switches. The device, designed for 1.54 μm infrared light, is composed of a triangular array of silicon pillars of diameter 400 nm with a lattice spacing of 616 nm embedded in a thin 400 nm thick polyimide matrix. Small changes in the incoming angle of light can produce large changes in the direction of the outgoing light near zero stress. Silicon pillars are formed by RIE etching and polyimide is then spun on, baked and etched to form the PC device. The PC matrix is then released from the oxide with a BOE etch. Samples with incident angles in the range of 0° ~ 8° have been tested. Strong negative refraction on the order of 50° is seen in the PC with the incident angle of 8°. This is in close agreement with the simulated results and clearly demonstrates the effectiveness of the photonic crystal device.

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M. Tinker, J. B. Lee, E. Schonbrun, and W. Park "Negative refraction based on the superprism effect in a micromachined flexible photonic crystal", Proc. SPIE 5840, Photonic Materials, Devices, and Applications, (7 July 2005); https://doi.org/10.1117/12.608736

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KEYWORDS

Silicon

Photonic crystals

Etching

Photonic crystal devices

Negative refraction

Polymers

Waveguides

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