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7 June 2005 UV sub-ps laser pulse patterning of Mo/Si and W/Si multilayers for soft x-ray gratings
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Proceedings Volume 5850, Advanced Laser Technologies 2004; (2005)
Event: Advanced Laser Technologies 2004, 2004, Rome and Frascati, Italy
The micropatteming of multilayer gratings (MLG) using ultraviolet sub-ps laser pulses is described. A micromachining system operating with a 0.5 ps KrF laser (248 nm) was used. Grating structures with a groove width in sub-pm region were created in Mo/Si, Si/Mo, W/Si and Si/W multilayers (MLs) with 5 (in one case 10) periods, each 7-10 nm thick. Grating area was up to 900 x 900 μm2. Laser fluence on the samples varied between 60 and 710 mJcm-2. Atomic force microscopy, scanning electron microscopy, X-ray reflectivity and X-ray diffraction were used to characterize multilayers and gratings. MIs were locally ablated up to the Si, oxidized Si or glass substrate, or deeper, using from 1 to 5 pulses. The roughness on the surface of lines and in grooves of MLG increased with the depth of ablation. It was caused first of all by debris. The ω-scans around the 1st Bragg maximum show symmetric satellites up to the 2nd or 3rd order, giving the evidence that the ML in MLG is preserved.
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E. Majkova, S. Luby, Y. Chushkin, M. Jergel, D. Papazoglou, A. Manousaki, C. Fotakis, G. Zergioti, and J. Sobota "UV sub-ps laser pulse patterning of Mo/Si and W/Si multilayers for soft x-ray gratings", Proc. SPIE 5850, Advanced Laser Technologies 2004, (7 June 2005);

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