A prospective modular platform of the mask pattern automatic inspection using the die-to-database method

Syarhei Avakaw; Aliaksandr Korneliuk; Alena Tsitko

doi:10.1117/12.617305

28 June 2005 A prospective modular platform of the mask pattern automatic inspection using the die-to-database method

Syarhei Avakaw, Aliaksandr Korneliuk, Alena Tsitko

Author Affiliations +

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617305
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

The paper presents a description of a new modular automatic reticle defect inspection platform and also a description of one of the main elements of this platform - a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.

Citation Download Citation

Syarhei Avakaw, Aliaksandr Korneliuk, and Alena Tsitko "A prospective modular platform of the mask pattern automatic inspection using the die-to-database method", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617305

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