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28 June 2005 Effectiveness of mask data process using OASIS format
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Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005)
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan
OASIS(Open Artwork System Interchange Standard) format was investigated for various logic device datas. In this investigation, the change in the processing time of the confirmation of the content of compression in OASIS and the mask data processing were confirmed. OASIS format has higher data compressibility than other methods, and its compressibility is independent on the data size. It is very effective in a advanced technology device according to the above-nentioned investigations. In data storage and data handling, applying after OPC processing is quite effective.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Katsuji Tabara, Mitsuo Sakurai, Seiji Makino, Takahisa Itoh, and Tomoyuki Okada "Effectiveness of mask data process using OASIS format", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005);


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