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28 June 2005 Improving OPC quality via interactions within the design-to-manufacturing flow (Invited Paper)
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Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617372
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan
Abstract
Today's design-manufacturing interface lacks essential mechanisms to link disparate disciplines and tool sets. In this paper, we describe three specific mechanisms for improving OPC quality via interactions within the design-to-manufacturing flow. Our studies of these improvements have yielded promising results.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Puneet Gupta, Andrew B. Kahng, and C.-H. Park "Improving OPC quality via interactions within the design-to-manufacturing flow (Invited Paper)", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617372
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