Introduction of a die-to-database verification tool for the entire printed geometry of a die: geometry verification system NGR2100 for DFM

Tadashi Kitamura; Kazufumi Kubota; Toshiaki Hasebe; Futoshi Sakai; Shinichi Nakazawa; Neeti Vohra; Masahiro Yamamoto; Masahiro Inoue

doi:10.1117/12.620389

28 June 2005 Introduction of a die-to-database verification tool for the entire printed geometry of a die: geometry verification system NGR2100 for DFM

Tadashi Kitamura, Kazufumi Kubota, Toshiaki Hasebe, Futoshi Sakai, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, Masahiro Inoue

Author Affiliations +

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.620389
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

The Geometry Verification System NGR2100 enables verification of the entire die, on a resist or an after-etch wafer, by comparing images of a die with corresponding target CAD data. The system detects systematic defects by variable criteria setting for allowable deformation quantities and obtains a CD distribution diagram. The result of systematic defects can then be used to make root cause analysis. The CD distribution diagram can achieve stepper aberration analysis, process windows extraction, macro-loading effect analysis, FEM measurement, and trend analysis more efficiently. Consequently, the Geometry Verification System NGR2100 will contribute to quicker TAT for DFM in Design, Lithography and Mask production.

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Tadashi Kitamura, Kazufumi Kubota, Toshiaki Hasebe, Futoshi Sakai, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, and Masahiro Inoue "Introduction of a die-to-database verification tool for the entire printed geometry of a die: geometry verification system NGR2100 for DFM", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.620389

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