Patterning of Ta/SiO2 high transmission EAPSM material for 193nm technology

Corinna Koepernik; H. W. Becker; J. Butschke; U. Buttgereit; M. Irmscher; L. Nedelmann; F. Schmidt; S. Teuber

doi:10.1117/12.617110

28 June 2005 Patterning of Ta/SiO₂ high transmission EAPSM material for 193nm technology

Corinna Koepernik, H. W. Becker, J. Butschke, U. Buttgereit, M. Irmscher, L. Nedelmann, F. Schmidt, S. Teuber

Proceedings Volume 5853, Photomask and Next-Generation Lithography Mask Technology XII; (2005) https://doi.org/10.1117/12.617110
Event: Photomask and Next Generation Lithography Mask Technology XII, 2005, Yokohama, Japan

Abstract

For the new Schott EAPSM Material, comprising a Ta/SiO₂/Cr stack, a patterning process has been developed. The material offers the advantage of an independent adjustment of phase shift and transmission and is applicable for different wavelengths. Because of very homogenous Ta and SiO₂ films and perfect etch selectivities it has been achieved a phase shift uniformity of 1.1° and a tight transmission deviation of 0.34% (absolute) across the entire mask. First dry etch process development has been focused on profiles and selectivities. The influence of process parameters on sidewall angle, profile bow, resist loss and Cr loss of the three patterning steps are shown. We have achieved excellent selectivities and a final sidewall angle of > 88°. The aerial image contrast of the first test plate is comparable to known attenuated phase shift material.

Citation Download Citation

Corinna Koepernik, H. W. Becker, J. Butschke, U. Buttgereit, M. Irmscher, L. Nedelmann, F. Schmidt, and S. Teuber "Patterning of Ta/SiO₂ high transmission EAPSM material for 193nm technology", Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); https://doi.org/10.1117/12.617110

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