Dispersive white-light interferometry for thin-film thickness profile measurement

Young-Sik Ghim; Seung-Woo Kim

doi:10.1117/12.612076

13 June 2005 Dispersive white-light interferometry for thin-film thickness profile measurement

Young-Sik Ghim, Seung-Woo Kim

Proceedings Volume 5856, Optical Measurement Systems for Industrial Inspection IV; (2005) https://doi.org/10.1117/12.612076
Event: Optical Metrology, 2005, Munich, Germany

Abstract

We describes a new scheme of dispersive white-light interferometer that is capable of measuring the thickness profile of thin-film layers, for which not only the top surface height profile but also the film thickness of the target surface should be measured at the same time. The interferometer is found useful particularly for in-situ inspection of micro-engineered surfaces such as liquid crystal displays, which requires for high-speed implementation of 3-D surface metrology.

Citation Download Citation

Young-Sik Ghim and Seung-Woo Kim "Dispersive white-light interferometry for thin-film thickness profile measurement", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); https://doi.org/10.1117/12.612076

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