Focal spot measurement in ultra-intense ultra-short pulse laser facility

Lanqin Liu; Hansheng Peng; Kainan Zhou; Xiaodong Wang; Xiaoming Zeng; Qihua Zhu; Xiaojun Huang; Xiaofeng Wei; Huan Ren

doi:10.1117/12.611993

13 June 2005 Focal spot measurement in ultra-intense ultra-short pulse laser facility

Lanqin Liu, Hansheng Peng, Kainan Zhou, Xiaodong Wang, Xiaoming Zeng, Qihua Zhu, Xiaojun Huang, Xiaofeng Wei, Huan Ren

Proceedings Volume 5856, Optical Measurement Systems for Industrial Inspection IV; (2005) https://doi.org/10.1117/12.611993
Event: Optical Metrology, 2005, Munich, Germany

Abstract

A peak power of 286-TW Ti:sapphire laser facility referred to as SILEX-I was successfully built at China Academy of Engineering Physics, for a pulse duration of 30 fs in a three-stage Ti:sapphire amplifier chain based on chirped-pulse amplification. The beam have a wavefront distortion of 0.63μm PV and 0.09μm RMS, and the focal spot with an f/2.2 OAP is 5.7μm, to our knowledge, this is the best far field obtained for high-power ultra-short pulse laser systems with no deformable mirror wavefront correction. The peak focused intensity of ~1021W /cm2 were expected.

Citation Download Citation

Lanqin Liu, Hansheng Peng, Kainan Zhou, Xiaodong Wang, Xiaoming Zeng, Qihua Zhu, Xiaojun Huang, Xiaofeng Wei, and Huan Ren "Focal spot measurement in ultra-intense ultra-short pulse laser facility", Proc. SPIE 5856, Optical Measurement Systems for Industrial Inspection IV, (13 June 2005); https://doi.org/10.1117/12.611993

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