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19 August 2005 Comparison of silicon oxide films deposited by RF ion beam sputtering and e-beam gun evaporation in visible to UV ranges
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Abstract
Silicon oxide thin films were deposited by RF ion beam sputtering and E-beam gun evaporation from two different starting materials, silicon and silica. The properties were studied by using the UV-Visible spectrometer, Fourier transform infrared spectrometer (FTIR) and atomic force microscopy (AFM). The refractive indices, extinction coefficients, surface roughness and molecular bonding structure of these films were discussed for visible to UV range application.
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Jean-Yee Wu and Cheng-Chung Lee "Comparison of silicon oxide films deposited by RF ion beam sputtering and e-beam gun evaporation in visible to UV ranges", Proc. SPIE 5870, Advances in Thin-Film Coatings for Optical Applications II, 58700G (19 August 2005); https://doi.org/10.1117/12.615822
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