Paper
8 September 2005 Research and development of MEMS x-ray optics
Author Affiliations +
Abstract
Development of a new light-weight and low-cost micro pore optics is reported. Utilizing anisotropic chemical wet etching of MEMS (Micro Electro Mechanical System) technology, a number of smooth sidewalls are obtained at once. These sidewalls are potential X-ray mirrors. As a first step of R&D, basic characters of sidewalls such as surface roughness and X-ray reflectivity are experimentally studied. Rms-roughness of 10 ~ 20Å is confirmed in a KOH-etched wafer. Furthermore, the X-ray reflection is for the first time detected at Mg Kα 1.25 keV. Based on the obtained results, numerical simulations of four-stage MEMS X-ray optics are performed for future satellite mission.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuichiro Ezoe, Kazuhisa Mitsuda, Makoto Mita, Masaki Koshiishi, Yoshitaka Ishisaki, Keisuke Shinozaki, and Akio Hoshino "Research and development of MEMS x-ray optics", Proc. SPIE 5900, Optics for EUV, X-Ray, and Gamma-Ray Astronomy II, 590013 (8 September 2005); https://doi.org/10.1117/12.616517
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Cited by 3 scholarly publications.
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KEYWORDS
Semiconducting wafers

X-rays

X-ray optics

Microelectromechanical systems

Silicon

Mirrors

Wafer-level optics

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