Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki; Masashi Okada; Yucong Zhu; Katsura Otaki; Zhiqiang Liu; Jun Kawakami; Mikihiko Ishii; Jun Saito; Katsuhiko Murakami; Masanobu Hasegawa; Chidane Ouchi; Seima Kato; Takayuki Hasegawa; Akiyoshi Suzuki; Hideo Yokota; Masahito Niibe; Mitsuo Takeda

doi:10.1117/12.616676

16 September 2005 Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, Mitsuo Takeda

Author Affiliations +

Proceedings Volume 5921, Advances in Metrology for X-Ray and EUV Optics; 59210D (2005) https://doi.org/10.1117/12.616676
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Comparisons between several at-wavelength metrological methods are reported. The comparisons are performed by measuring one test optic with several kinds of measurement methods from the viewpoints of accuracy, precision and practicality. According to our investigation, we found that the PDI, the LDI, and the CGLSI are the most suitable methods for evaluating optics for EUV lithography.

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Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, and Mitsuo Takeda "Comparisons between EUV at-wavelength metrological methods", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210D (16 September 2005); https://doi.org/10.1117/12.616676

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