Paper
16 September 2005 Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories
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Abstract
This paper presents the first series of round-robin metrology measurements of x-ray mirrors organized at the Advanced Photon Source (APS) in the USA, the European Synchrotron Radiation Facility in France, and the Super Photon Ring (SPring-8) (in a collaboration with Osaka University,) in Japan. This work is part of the three institutions' three-way agreement to promote a direct exchange of research information and experience amongst their specialists. The purpose of the metrology round robin is to compare the performance and limitations of the instrumentation used at the optical metrology laboratories of these facilities and to set the basis for establishing guidelines and procedures to accurately perform the measurements. The optics used in the measurements were selected to reflect typical, as well as state of the art, in mirror fabrication. The first series of the round robin measurements focuses on flat and cylindrical mirrors with varying sizes and quality. Three mirrors (two flats and one cylinder) were successively measured using long trace profilers. Although the three facilities' LTPs are of different design, the measurements were found to be in excellent agreement. The maximum discrepancy of the rms slope error values is 0.1 μrad, that of the rms shape error was 3 nm, and they all relate to the measurement of the cylindrical mirror. The next round-robin measurements will deal with elliptical and spherical optics.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lahsen Assoufid, Amparo Rommeveaux, Haruhiko Ohashi, Kazuto Yamauchi, Hidekazu Mimura, Jun Qian, Olivier Hignette, Tetsuya Ishikawa, Christian Morawe, Albert Macrander, Ali Khounsary, and Shunji Goto "Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210J (16 September 2005); https://doi.org/10.1117/12.623209
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Cited by 8 scholarly publications.
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KEYWORDS
Mirrors

Silicon

Metrology

Data conversion

Error analysis

Sensors

X-rays

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