Mirror metrology and bender characterization at ESRF

Amparo Rommeveaux; Olivier Hignette; Christian Morawe

doi:10.1117/12.621379

16 September 2005 Mirror metrology and bender characterization at ESRF

Amparo Rommeveaux, Olivier Hignette, Christian Morawe

Author Affiliations +

Proceedings Volume 5921, Advances in Metrology for X-Ray and EUV Optics; 59210N (2005) https://doi.org/10.1117/12.621379
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

The ESRF optics metrology laboratory was created 15 years ago. Various measurement devices have been progressively installed and the present status of available equipment will be briefly presented. Since the beginning of the first beamline construction, all X-ray mirrors have been tested before their installation. Most of the mirrors are mounted on mechanical bending systems, and it is mandatory to characterize optical elements under working conditions and to calibrate the systems before their installation on a beamline. These calibrations are now part of the acceptance tests whenever a system is delivered. Optics tests carried out on the Long Trace Profiler (LTP) will be described, with particular emphasis on the special configuration developed for mirrors facing down. Measurement reproducibility and accuracy achieved with the LTP will be discussed. The emerging micro focusing needs at ESRF have promoted the development of Kirkpatrick-Baez systems. Precise metrology plays an important role to control the mirror clamping using interferometry techniques and to predict the performance of the system using the LTP. The automatic shaping procedure will be described.

Citation Download Citation

Amparo Rommeveaux, Olivier Hignette, and Christian Morawe "Mirror metrology and bender characterization at ESRF", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210N (16 September 2005); https://doi.org/10.1117/12.621379

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