Integrated nano-optic devices based on immersion nano-gratings made by imprint-lithography and nano-trench-filling technology

Jian Wang; Xuegong Deng; Paul Sciortino; Ron Varghese; Anguel Nikolov; Feng Liu; Xiaoming Liu; Lei Chen

doi:10.1117/12.615951

27 August 2005 Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology

Jian Wang, Xuegong Deng, Paul Sciortino, Ron Varghese, Anguel Nikolov, Feng Liu, Xiaoming Liu, Lei Chen

Author Affiliations +

Proceedings Volume 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II; 59310C (2005) https://doi.org/10.1117/12.615951
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Nano-optic retarders and polarizers based on dielectric and metal nano-gratings were fabricated by UV-nanoimprint lithography. Different from conventional nanostructure-based optical devices, atomic layer deposition, a highly uniform and conformal deposition process, were utilized to fill trenches of the both dielectric and metal nano-gratings. The resulted immersion nano-grating design opens a path for innovative nano-grating based optical devices and integrated optical devices. As an example, a high-performance fully-buried aluminum nanowire-gird polarizer was developed which allowed us to achieve a monolithically integrated visible circular polarizer. The ability to integrate multiple nanostructure-based optical layers opens a path for innovative integrated optical devices as well as a new strategy for driving both miniature and cost.

Citation Download Citation

Jian Wang, Xuegong Deng, Paul Sciortino, Ron Varghese, Anguel Nikolov, Feng Liu, Xiaoming Liu, and Lei Chen "Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310C (27 August 2005); https://doi.org/10.1117/12.615951

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