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27 August 2005 Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft x-ray source
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Abstract
The results of experiments on micromachining of organic polymers by direct photo-etching using a compact laser plasma soft X-ray source based on a gas puff target are presented. Soft X-ray radiation in the wavelength range from 2 to 15 nm was produced as a result of irradiation of a double-stream gas puff target with 0.8 J/3 ns laser pulses from a Nd:YAG laser. The soft X-ray pulses with energy of about 100-200 mJ in a single pulse were used to irradiate samples from organic polymers to form microstructures. The obtained results show that direct photo-etching using the laser plasma soft X-ray source could be useful for micromachining of organic polymers. Strong enhancement of the photo-etching process was observed for the samples heated up to 140oC.
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H. Fiedorowicz, A. Bartnik, R. Jarocki, J. Kostecki, R. Rakowski, and M. Szczurek "Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft x-ray source", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310H (27 August 2005); https://doi.org/10.1117/12.615890
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