Catadioptric projection lenses for immersion lithography

Heiko Feldmann; Aurelian Dodoc; Alexander Epple; Hans-Jürgen Rostalski; David Shafer; Wilhelm Ulrich

doi:10.1117/12.625199

14 October 2005 Catadioptric projection lenses for immersion lithography

Heiko Feldmann, Aurelian Dodoc, Alexander Epple, Hans-Jürgen Rostalski, David Shafer, Wilhelm Ulrich

Proceedings Volume 5962, Optical Design and Engineering II; 59620Y (2005) https://doi.org/10.1117/12.625199
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

Recently, the development of high NA lenses for immersion lithography turned from dioptric concepts to catadioptric design forms. The introduction of mirrors involves the new challenge to deal with the inevitable obscuration of either field or pupil. We review the strategies used in this regard for microlithography, while focussing on the two most favored ones, folded and inline concepts. Although the vignetting situation is more complicated for inline systems, we report progress in this field of optical design yielding similar system performance for inline and folded designs. Since inline optical systems are much easier to realize, these are the concept of choice.

Citation Download Citation

Heiko Feldmann, Aurelian Dodoc, Alexander Epple, Hans-Jürgen Rostalski, David Shafer, and Wilhelm Ulrich "Catadioptric projection lenses for immersion lithography", Proc. SPIE 5962, Optical Design and Engineering II, 59620Y (14 October 2005); https://doi.org/10.1117/12.625199

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