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4 October 2005 Oxide and fluoride coatings for the excimer wavelength 193nm
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The requirements to produce high performance coatings increase dramatically when moving from 248 nm to 193 nm. The quality of DUV thin film components is mainly determined by the optical properties of the applied layer materials. The reduction of losses due to scattering and absorption of dielectric materials is essential for excellent properties of the coating results. The most common oxide and fluoride materials SiO2, Al2O3, MgF2 and LaF3 have been investigated and optimized. Plasma ion assisted deposition was applied for the deposition of the oxide materials, using improved coating equipment such as the modified APSpro (advanced plasma source). The paper reports the results of DUV coatings using plasma ion assisted deposition for the oxide materials. Single layers of silica and alumina and multilayer systems with both materials were investigated. In addition, MgF2 and LaF3, conventionally coated at very high temperatures, have been performed to demonstrate the improved capabilities of the optimized SYRUSpro DUV for DUV applications with all the new features.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Götzelmann, Harro Hagedorn, Alfons Zöller, Alexei Kobiak, and Werner Klug "Oxide and fluoride coatings for the excimer wavelength 193nm", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630L (4 October 2005);


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