Temperature dependence of the optical properties of mixed oxide thin films deposited by reactive magnetron sputtering

M. Vergöhl; B. Hunsche; A. Ritz

doi:10.1117/12.625069

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4 October 2005 Temperature dependence of the optical properties of mixed oxide thin films deposited by reactive magnetron sputtering

M. Vergöhl, B. Hunsche, A. Ritz

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Proceedings Volume 5963, Advances in Optical Thin Films II; 596315 (2005) https://doi.org/10.1117/12.625069
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

The optical properties of TaZrO_x mixed oxide thin films are investigated. The films were deposited by reactive pulsed magnetron sputtering in a double magnetron set up using two Ta and Zr metallic targets. Depending on the mixture of the materials, crystallization at different temperature occurs. For a specific mixture, temperature stability of more than 950°C could be demonstrated. This is more than another value of TiAlO_x thin films reported very recently.

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M. Vergöhl, B. Hunsche, and A. Ritz "Temperature dependence of the optical properties of mixed oxide thin films deposited by reactive magnetron sputtering", Proc. SPIE 5963, Advances in Optical Thin Films II, 596315 (4 October 2005); https://doi.org/10.1117/12.625069

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